FSRM - Cours: Porous Silicon for Design and Fabrication of Microsystems

Porous Silicon for Design and Fabrication of Microsystems

course photo

Kursziele

Porous silicon offers new fabrication technologies for microsystems. Besides its use as sacrificial layer, it raised interest in microsystems because of its extraordinary material properties, like an internal surface of 600 m2 / cm3 that makes it highly efficient for biochemical sensors and reactors. Porous silicon can also serve as optical filter. In combination with sub-surface electropolishing it makes innovative micromachining processes possible. The course gives an introduction how porous silicon can be used to design and fabricate microsystems. Different process parameters for nano-, meso and macroporous silicon will be discussed. The combination with conventional silicon MEMS technologies will be shown. Devices of different domains will illustrate applications of this versatile material and ways of system integration. Reliability and long term stability for industrial applications will be discussed.

Zielpublikum

The course is structured to appeal to a wide range of R&D staff, marketing and business development managers and engineers from institutes as well as companies active in microsystems and sensors design.

Inhalt

Fabrication of porous silicon by electrochemical etching
Equipment and work safety
Pore sizes, distribution, fabrication parameters, process calibration
Suitable mask technologies for microstructuration
Porous silicon as sacrificial layer for MEMS
Electropolishing for mechanical applications, actuators
Optical applications using porous silicon, microspectrometer
Microfluidics, chemical and biological applications
Long term stability and passivation of porous silicon

Kursleiter

Dr Gerhard Lammel from Bosch Sensortec GmbH, Reutlingen, Germany. Gerhard Lammel studied physics and national economics at the University of Munich. He founded two small high-tech companies for computer networks and computer graphics in 1991 and 1995. He obtained his PhD in 2001 from the Swiss Federal Institute of Technology in Lausanne for new micromachining technologies using porous silicon. After that he started at Robert Bosch GmbH in Reutlingen, Germany, in the field of MEMS process development for automotive sensors. Since 2005 he is Engineering Manager at Bosch Sensortec GmbH, Reutlingen, where he is responsible for the product development of MEMS sensors.