FSRM - Course: Electron Microscopy: recent progress in methodologies and new applications

Electron Microscopy: recent progress in methodologies and new applications

course photo

Objectifs du cours

The goal of this course is to introduce the participants to electron microscopy (EM) which allows the characterization of materials at the nanoscale. The course emphasizes the recent development of new techniques in electron microscopy. The topics covered include

SEM related techniques and applications:

Environmental Scanning Electron Microscope (ESEM) and application for non-conductor materials: ceramics, polymers
Wet mode in ESEM and its application in surface technology
Focused Ion Beam (FIB) and its application for micro and nano scale machining
Electrical Conductivity Imaging by electron Beam Induced Current (EBIC) and its application for solar cells and semiconductors
Electron Back Scattered Diffraction pattern (EBSD) and application on thin film technology
Through Lens detector and its application for High Resolution imaging Beam Deceleration Technique and High resolution imaging by SEM

TEM related techniques:

3D tomography at nanoscale and its application for Nano composite materials
ChemiSTEM and its application for chemical analysis of fine microstructres
High Resolution Electron Energy Loss Spectroscopy (EELS) for interface characterization

The topics will be illustrated by practical examples. The course will treat and answer the following questions:
- how these instruments and techniques work
- on which physical principles they are based
- in which field of micro and nanotechnology they are used
- how their results could be interpreted for explaining a phenomenon

Public cible

R&D people in the field of microtechnology, material sciences and electronics.

Contenu

Introduction:

Principles of electron microscope
Resolution in electron microscopy

Scanning Electron Microscope (SEM) and Environmental SEM (ESEM):

Principles of SEM and ESEM
SE, BSE, GSE and TLD detectors
EBSD, EBIC, beam deceleration

Focused Ion Beam (FIB): principle and application

Energy Dispersive X-Ray Spectrometer (EDS), limitations and resolution

Transmission Electron Microscope (TEM):

Principles of TEM
Different types of imaging: amplitude contrast and phase contrast
High resolution TEM
3D TEM tomography
EELs and HREELS
Chemistem

Visit of microscopy laboratories

Enseignant(s)

Dr M.M. Dadras, is currently head of Microscopy and nanoscopy facilities at CSEM SA, Neuchâtel, Switzerland. M.M Dadras received his his Ph.D. at the University of Orsay, France in 1990. He has over 20 years experiences in Material Science and Electron Microscopy working initially at Institute of Structural Metallurgy of the University of Neuchâtel, Swissmetal, Institute of Microtechnology (IMT) at the University of Neuchâtel. In April 2008, after restructuring of IMT and transfer of microscopy section to CSEM, he became head of Microscopy and nanoscopy facilities in CSEM. His research activities are focused on microstructural studies and the relation of microstructure to the properties. Presently, his research activities are oriented towards the microstructural study and the improvement of properties of thin layers used in microfabricated sensors, actuators and microsystems.

Dr Sousan Abolhassani, Responsible for the Electron Microscopy at Paul Scherrer Institute, Switzerland. Sousan Abolhassani received her B.Sc. Degree from University of Surry in UK .Sc. In Materials Science and Technology in 1979. She continued her studies at the National Institute of Nuclear Science and Technology (I.N.S.T.N.) where she obtained her D.E.A (Diplôme d’Étude Approfondies) in 1987. She received her Ph.D. in Material Science and Solid State Chemistry. 1991 from Laboratoire de Chimie Appliquée de l'Etat Solide, École Nationale Supérieure de Chimie de Paris, and Université d’Orsay, France. She then started research in electron microscopy with the specialisation in Electron Energy Loss Spectroscopy at the University of Lausanne, in collaboration with the Centre of Electron Microscopy. In 1998, she changed to Paul Scherrer Institute where she is Responsible for the Electron Microscopy. She has a long teaching experience in the field of Electron microscopy (University of Lausanne), TEM and HRTEM image simulation and EELS and its application in microtechnology (University of Neuchâtel).