Next-generation lithography with focused electron beams

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Course Objectives

This course is organised with the collaboration of EMPA

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Next-generation lithography using focused electron and ion beams relies on electron-triggered reactions with adsorbed molecules introduced into the microscope chamber. It is a three-dimensional, maskless, nanoscale, and minimally-invasive concept of lithography, which can be applied to planar as well as to delicate pre-structured surfaces. Injecting functional molecules into a scanning electron microscope (SEM) opens exciting new ways to fabricate novel materials in order to prototype, repair, or trim micro- and nanodevices in an in situ, one-step manner. This lithography technique is already used in the semiconductor industry for lithography mask repair of the 45 nm and 32 nm node and for fabrication of robust, high-aspect ratio AFM tips used for via inspection. Due to its high flexibility in material and shape, this lithography is also increasingly used as a prototyping tool in R&D labs of industry and academia to prove device concepts in the fields of nanophotonics, nanobiology, and nanoelectronics. The first part of the lecture is an introduction to the concept of gas-assisted focused electron beam nanofabrication and related equipment enabling the performance and in situ control of this next generation lithography. The complimentarity to focused ion beam nanofabrication (damage and implantation) is discussed. The second part focuses on applications. Based on numerous examples the great technological potential of this nanofabrication concept is pointed out.

Target group

The course is structured to appeal to R&D managers and R&D scientists and engineers from industry and academic institutes involved in the development, prototyping, and analysis of micro- and nanodevices.



Dr. Ivo Utke from EMPA Swiss Federal Laboratories for Materials Research and Technology at Thun, Switzerland. Ivo Utke has been working in the fields of materials sciences and nanotechnology since he received his PhD in Natural Sciences in 1995 at the Humboldt University in Berlin. He worked for 9 years as a scientist at the École Polytechnique Fédérale de Lausanne (CH)and joined Empa, the Swiss Federal Laboratories for Materials Science and Technology, about 5 years ago. Recently he was appointed Deputy Head of the Laboratory for Mechanics of Materials and Nanostructures. He has (co-)authored more than 50 scientific publications and has extensive experience as organizer, steering committee member, and chairperson of international conferences and workshops. Recent publishing activities comprise the edition of a book and the release of a comprehensive review on focused electron and ion beam nanofabrication.

Information and registration

Date and place (

1 day


CHF 640.00
EUR 540.00

Course Language


Ivo Utke